Company profile
Irresistible Materials Ltd
Irresistible Materials Developing advanced materials for a new generation of microchip technology
Irresistible Materials Ltd is a UK company with status active founded in 2009 based in Wales.
Corporate ownership
Updated 06 Jun 2026 16:52
Company events
Reference milestones and recent Companies House filing stream events.
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Incorporated
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Projects
Industrial Development of novel photoresists for high-NA EUV enabling UK-based semiconductor manufacturing scale-up
1 Jun 2024 to 31 May 2025
Semiconductors are embedded in everyday items (smartphones/computers) and high-tech industry-critical commodities (hypersonic weapons/stealth aircrafts). As industries continue to harness computer power, semiconductor dependence grows. However, semiconductor supply and value-chains are fragmented, complex and unstable, with manufacturing-critical speciali...
Next generation photo-resists for EUV lithography
1 Oct 2020 to 30 Jun 2021
Irresistible Materials (IM) is developing next generation photo-resist materials for the semiconductor industry. A photo-resist is used within the manufacturing process of microchips. It acts as a type of mask that enables patterns to be etched into silicon through a process known as lithography. It is these features etched into silicon that act as the 'w...
Novel photo-resist material for next generation micro-chips
1 Dec 2017 to 30 Nov 2018
"Irresistible Materials (IM) is developing next generation photo-resist materials for the semiconductor industry. A photo-resist is used within the manufacturing process of microchips. It acts as a type of mask that enables patterns to be etched into silicon through a process known as lithography. It is these features etched into silicon that act as the '...
Metal containing resists for next generation photolithography
1 Dec 2015 to 30 Nov 2016
Irresistible Materials (IM) is developing next generation photo-resist materials for the semiconductor industry. A photo-resist is a material that undergoes a change in physical or chemical properties when exposed to radiation. Within the semiconductor industry, silicon substrates are coated by a photo-resist, the resist is then selectively exposed to rad...
Next Generation 'Spin-on-carbon hard masks' for the semiconductor industry
1 Jul 2014 to 30 Jun 2015
Irresistible Materials (IM) is developing next generation ‘spin-on carbon hard masks’ for the semiconductor industry. Since the 1970s computational capacity has doubled every 18 months, driven by the famous Moore's Law. The end of Moore’s law is predicted but innovations in microfabrication have allowed further progress. Computing and digital communicatio...
Next Generation Photoresist Technology for Microchips
1 Apr 2012 to 31 Jul 2013
Irresistible Materials (IM) is developing next generation ‘photo-resist materials’ for the semiconductor industry. A photo-resist is a material that undergoes a change in its physical and/or chemical properties when exposed to radiation. Within the semiconductor industry, silicon substrates are coated by a photo-resist, and the resist is then selectively ...