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Company profile

Irresistible Materials Ltd

Irresistible Materials Developing advanced materials for a new generation of microchip technology

Irresistible Materials Ltd is a UK company with status active founded in 2009 based in Wales.

CRN
06847082
Founded
2009
Age
17

Overview

Legal name
IRRESISTIBLE MATERIALS LTD
Region
Wales
Registered address
C/O BEVAN BUCKLAND LLP GROUND FLOOR CARDIGAN HOUSE
CASTLE COURT SWANSEA ENTERPRISE PARK
SWANSEA
WALES
SA7 9LA
Insolvency history
No

Corporate ownership

Updated 06 Jun 2026 16:52

1 level 1 ultimate controller
1
Company Active LTD
Irresistible Materials Ltd
CRN 06847082
2
Direct and ultimate controller
3020001069823
CRN 3020001069823

Company events

Reference milestones and recent Companies House filing stream events.

5 events
30 Mar
2027

Confirmation statement due

Confirmation Due

Next confirmation statement due date

31 Dec
2026

Accounts due

Accounts Due

Next accounts due date

16 Mar
2026

Confirmation statement filed

Confirmation

Last confirmation statement made up date

31 Mar
2025

Accounts filed

Accounts

Last accounts made up date

16 Mar
2009

Incorporated

Inception

Company registered at Companies House

Public funding

6 awards
First funded
2012
Funded years
2012, 2014, 2015, 2017, 2020, 2024
Age at first award
3 years

Projects

2024 Collaborative R&D Lead participant

Industrial Development of novel photoresists for high-NA EUV enabling UK-based semiconductor manufacturing scale-up

1 Jun 2024 to 31 May 2025

Awarded
£1,522,360
Total cost £2,174,800

Semiconductors are embedded in everyday items (smartphones/computers) and high-tech industry-critical commodities (hypersonic weapons/stealth aircrafts). As industries continue to harness computer power, semiconductor dependence grows. However, semiconductor supply and value-chains are fragmented, complex and unstable, with manufacturing-critical speciali...

2020 Collaborative R&D Lead participant

Next generation photo-resists for EUV lithography

1 Oct 2020 to 30 Jun 2021

Awarded
£174,689
Total cost £499,112

Irresistible Materials (IM) is developing next generation photo-resist materials for the semiconductor industry. A photo-resist is used within the manufacturing process of microchips. It acts as a type of mask that enables patterns to be etched into silicon through a process known as lithography. It is these features etched into silicon that act as the 'w...

2017 Feasibility Studies Lead participant

Novel photo-resist material for next generation micro-chips

1 Dec 2017 to 30 Nov 2018

Awarded
£323,998
Total cost £462,854

"Irresistible Materials (IM) is developing next generation photo-resist materials for the semiconductor industry. A photo-resist is used within the manufacturing process of microchips. It acts as a type of mask that enables patterns to be etched into silicon through a process known as lithography. It is these features etched into silicon that act as the '...

2015 GRD Proof of Concept Lead participant

Metal containing resists for next generation photolithography

1 Dec 2015 to 30 Nov 2016

Awarded
£100,000
Total cost £166,746

Irresistible Materials (IM) is developing next generation photo-resist materials for the semiconductor industry. A photo-resist is a material that undergoes a change in physical or chemical properties when exposed to radiation. Within the semiconductor industry, silicon substrates are coated by a photo-resist, the resist is then selectively exposed to rad...

2014 GRD Proof of Concept Lead participant

Next Generation 'Spin-on-carbon hard masks' for the semiconductor industry

1 Jul 2014 to 30 Jun 2015

Awarded
£100,000
Total cost £166,841

Irresistible Materials (IM) is developing next generation ‘spin-on carbon hard masks’ for the semiconductor industry. Since the 1970s computational capacity has doubled every 18 months, driven by the famous Moore's Law. The end of Moore’s law is predicted but innovations in microfabrication have allowed further progress. Computing and digital communicatio...

2012 GRD Proof of Concept Lead participant

Next Generation Photoresist Technology for Microchips

1 Apr 2012 to 31 Jul 2013

Awarded
£100,000
Total cost £166,877

Irresistible Materials (IM) is developing next generation ‘photo-resist materials’ for the semiconductor industry. A photo-resist is a material that undergoes a change in its physical and/or chemical properties when exposed to radiation. Within the semiconductor industry, silicon substrates are coated by a photo-resist, and the resist is then selectively ...

Product types

Collaborative R&D Feasibility Studies GRD Proof of Concept